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  • High Temperature Superconducting Thin Film Single Crystal Substrate Magnesium Oxide (MgO)  Wafer
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  • High Temperature Superconducting Thin Film Single Crystal Substrate Magnesium Oxide (MgO)  Wafer

High Temperature Superconducting Thin Film Single Crystal Substrate Magnesium Oxide (MgO) Wafer

High Temperature Superconducting Thin Film Single Crystal Substrate Magnesium Oxide (MgO) Wafer
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High-Temperature Superconducting Thin Film Single Crystal Substrate Magnesium Oxide (MgO) Wafer

It is widely used in ferroelectric thin films, magnetic thin films, photoelectric thin films and high temperature superconducting thin films. Because its dielectric constant and loss in microwave band are very small, and it can obtain a large area substrate, it is one of the important high temperature superconducting thin film single crystal substrates in current industrialization. It can be used to make high-temperature superconducting microwave filters and other devices required by mobile communication equipment.
 
Magnesium oxide (MgO) crystal and substrate
Growth Method Arc melting method
Crystal Structure Cubic (a = 4.216 Å)
Density 3.58g/cm3
Purity 99.95%
Coefficient Of Thermal Expansion 12.8ppm/℃
Dielectric Constant nine point eight
Optical Transmittance >90% (200~400nm), >98% (500~1000nm)
Crystal Orientation < 100 >, < 110 >, < 111 > ± 0.5 ° or special direction
Size dia2”  × 0.5mm, 25 × twenty-five × 0.5mm, 15 × fifteen × 0.5mm 10 × ten × 0.5mm, 10 × five × 0.5mm, 5 × five × 0.5mm
Polishing Single or double sided polishing
Surface Roughness ≤5Å
Encapsulation Class 100 ultra clean bag, single or multi wafer box
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